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Researchers improve fabrication process of nano-structures for electronic devices

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Researchers at RIT have found a more efficient fabricating process to produce semiconductors used in today’s electronic devices. They also confirmed that materials other than silicon can be used successfully in the development process that could increase performance of electronic devices. This fabrication process—the I-MacEtch, or inverse metal-assisted chemical etching method—can help meet the growing demand for more powerful and reliable nano-technologies needed for solar cells, smartphones, telecommunications grids and new applications in photonics and quantum computing.